JPH0723901Y2 - イオン注入用制御装置 - Google Patents
イオン注入用制御装置Info
- Publication number
- JPH0723901Y2 JPH0723901Y2 JP1987175466U JP17546687U JPH0723901Y2 JP H0723901 Y2 JPH0723901 Y2 JP H0723901Y2 JP 1987175466 U JP1987175466 U JP 1987175466U JP 17546687 U JP17546687 U JP 17546687U JP H0723901 Y2 JPH0723901 Y2 JP H0723901Y2
- Authority
- JP
- Japan
- Prior art keywords
- unit
- control unit
- signal
- control
- host computer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005468 ion implantation Methods 0.000 title claims description 31
- 238000012544 monitoring process Methods 0.000 claims description 25
- 150000002500 ions Chemical class 0.000 description 29
- 239000013307 optical fiber Substances 0.000 description 19
- 230000001133 acceleration Effects 0.000 description 16
- 238000010884 ion-beam technique Methods 0.000 description 10
- 235000012431 wafers Nutrition 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 7
- 230000005540 biological transmission Effects 0.000 description 4
- 238000002513 implantation Methods 0.000 description 4
- 230000008054 signal transmission Effects 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000007943 implant Substances 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 230000004043 responsiveness Effects 0.000 description 2
- 238000004891 communication Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987175466U JPH0723901Y2 (ja) | 1987-11-16 | 1987-11-16 | イオン注入用制御装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987175466U JPH0723901Y2 (ja) | 1987-11-16 | 1987-11-16 | イオン注入用制御装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0179261U JPH0179261U (en]) | 1989-05-29 |
| JPH0723901Y2 true JPH0723901Y2 (ja) | 1995-05-31 |
Family
ID=31467257
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987175466U Expired - Lifetime JPH0723901Y2 (ja) | 1987-11-16 | 1987-11-16 | イオン注入用制御装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0723901Y2 (en]) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9117627B2 (en) | 2013-08-29 | 2015-08-25 | Sumitomo Heavy Industries Technology Co., Ltd. | Ion implantation apparatus and ion implantation method |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61243651A (ja) * | 1985-04-19 | 1986-10-29 | Toshiba Corp | イオン注入装置 |
| JPH0732501B2 (ja) * | 1986-04-15 | 1995-04-10 | 日新電機株式会社 | イオン注入監視制御装置 |
-
1987
- 1987-11-16 JP JP1987175466U patent/JPH0723901Y2/ja not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9117627B2 (en) | 2013-08-29 | 2015-08-25 | Sumitomo Heavy Industries Technology Co., Ltd. | Ion implantation apparatus and ion implantation method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0179261U (en]) | 1989-05-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP7373656B2 (ja) | 絶縁されたライナック共振器ピックアップ回路 | |
| Fan et al. | Telemicroscopy | |
| JPH0723901Y2 (ja) | イオン注入用制御装置 | |
| JPH0234151B2 (en]) | ||
| JPS62128424A (ja) | イオン注入装置用制御システム | |
| Corsini et al. | Beam dynamics for the CTF3 preliminary phase | |
| JPH0732501B2 (ja) | イオン注入監視制御装置 | |
| Eshraqi et al. | First Protons in the ESS LINAC | |
| JPS62126535A (ja) | イオン注入装置用制御システム | |
| JPS62126536A (ja) | イオン注入装置用制御装置 | |
| Bannister et al. | Control system for the ORNL multicharged ion research facility high-voltage platform | |
| Nawrocky et al. | Automatic steering of X-ray beams from NSLS insertion devices using closed orbit feedback | |
| JP3431220B2 (ja) | 粒子加速器のビーム位置モニタ装置 | |
| JPH08273895A (ja) | イオンビームの加速装置 | |
| JP2685306B2 (ja) | 粒子加速器のビーム位置モニタ装置 | |
| Stiliaris et al. | Control system implementation for the IASA microtron | |
| Losh et al. | New 20-kW CW transmitter for NASA's deep space network | |
| JPH0793124B2 (ja) | イオン注入装置 | |
| Milton et al. | FIRST BEAM IN A NEW COMPACT INTENSE 30 MeV H" CYCLOTRON FOR ISOTOPE PRODUCTION | |
| CN118778494A (zh) | 一种双聚焦质谱仪的电控系统、双聚焦质谱仪 | |
| Latshaw et al. | PIP-II Resonance Control System | |
| Jensen | Inductive output tube based 300 kW RF amplifier for the Diamond Light Source | |
| Di Pirro et al. | A DISTRIBUTED DIGITAL CAMERA SYSTEM FOR ACCELERATOR OPTICAL DIAGNOSTICS | |
| CN117577500A (zh) | 一种分散集中式注入机高压平台光纤传输控制监测系统 | |
| Chang et al. | Control System for Superconducting Electron Cyclotron Resonance Ion Source with Advanced Design in Lanzhou II |